Overview of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

Aluminum Nitride Ceramic is an advanced ceramic material with aluminum nitride as the main component. It has been widely used in electronics, optics, and mechanics due to its unique properties.

Features of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

High thermal conductivity: Aluminum nitride ceramics have relatively high thermal conductivity, usually between 170-260 W/m·K, which makes it an excellent heat dissipation material. It is especially suitable for electronic devices that require efficient heat dissipation, such as substrate materials for power semiconductor devices.

Good electrical insulation: Despite its high thermal conductivity, aluminum nitride ceramics are excellent insulators of electricity, which can effectively prevent current leakage and ensure the safe operation of electronic components.

Low dielectric constant and dielectric loss: These characteristics make aluminum nitride ceramics very suitable for use in high-frequency circuits because it can reduce energy loss during signal transmission.

High temperature resistance: Aluminum nitride ceramics can maintain structural stability and strength at extremely high temperatures. Its melting point is about 2800°C, so it is suitable for applications in high temperature environments.

Low thermal expansion coefficient: Compared with semiconductor materials such as silicon, aluminum nitride has a lower thermal expansion coefficient, which means it has better dimensional stability when the temperature changes, which helps improve packaging reliability.

Corrosion resistance: Aluminum nitride ceramics have good chemical stability to most molten metals and are not easily oxidized or corroded, allowing them to perform well in harsh environments.

High mechanical strength: Although not as hard as some other types of ceramic materials, aluminum nitride ceramics still provide enough mechanical strength to allow them to be used in many structural applications.

(High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry)

Specifications of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

This High Temperature AlN Aluminum Nitride Ceramic Tray Heating Plate deals with requiring semiconductor processes. It endures severe warmth accurately. The core product is high-purity light weight aluminum nitride ceramic. AlN supplies excellent thermal conductivity. Heat spreads quickly and equally across home plate surface. This protects against hotspots throughout wafer processing. Temperature harmony is vital for constant outcomes.

Home plate operates dependably approximately 450 ° C. It keeps steady performance over long periods. This stability is crucial for constant production runs. The burner is incorporated straight right into the ceramic. This design ensures efficient warmth transfer. It also safeguards the heating element from damages. Home plate surface area is extremely flat and smooth. This protects against wafer bending or scraping. Surface surface is precisely managed. It fulfills stringent semiconductor market criteria.

Durability is a crucial function. AlN ceramic stands up to thermal shock extremely well. Fast temperature changes will not fracture home plate. It likewise resists chemical corrosion. Extreme process gases and chemicals won’t degrade it. This makes sure a long service life. Home plate calls for very little upkeep. It saves downtime and replacement prices.

Requirement dimensions are offered to fit typical tools. Customized shapes and sizes can likewise be created. The plate links conveniently to existing systems. Electrical connections are created for safety and security and reliability. Power requirements are plainly specified. The plate offers consistent home heating for essential actions. These consist of annealing, bonding, and lithography. Regular temperature level control enhances return. It improves total semiconductor manufacturing top quality. This part is necessary for advanced fabrication.

(High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry)

Applications of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

Heat light weight aluminum nitride ceramic tray home heating plates serve essential roles in semiconductor manufacturing. These trays deal with intense warmth accurately. They move heat very evenly throughout surface areas. This even heating is important for regular chip manufacturing.

These AlN trays operate at extremely high temperatures without degrading. They endure repeated thermal cycling conveniently. This toughness lowers substitute expenses substantially. Semiconductor refines demand such steady efficiency.

AlN ceramic deals exceptional electrical insulation. This stops dangerous current leaks. It secures sensitive electronic parts throughout heating actions. Safety and component integrity are non-negotiable.

Chemical resistance is an additional significant benefit. AlN trays stand up to assault from extreme handling gases and chemicals. They stop contamination of wafers. Maintaining wafers pure is essential for high returns. Contamination damages expensive semiconductor batches.

These trays prevail in diffusion heating systems. They hold silicon wafers throughout high-temperature doping. They are additionally utilized for annealing processes. Annealing repair work wafer crystal structure after ion implantation. Uniform home heating is important right here.

Epitaxial growth processes utilize these plates also. Growing thin crystalline layers on wafers requires accurate temperature control. AlN trays provide that control. They make certain layer harmony and high quality.

The product’s high thermal conductivity relocates heat away quick. This allows quick heating and cooling down cycles. Faster cycles raise production throughput. Rate issues in high-volume chip fabs.

AlN preserves its strength at functional temperature levels. It doesn’t warp or droop under tons. This dimensional stability maintains wafers flawlessly placed. Precision positioning is necessary for modern-day semiconductor nodes.

Company Introduction

Advanced Ceramics founded on October 17, 2014, is a high-tech enterprise committed to the research and development, production, processing, sales and technical services of ceramic relative materials and products.. Since its establishment in 2014, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Silicon carbide ceramic products, Boron Carbide Ceramic Products, Boron Nitride Ceramic Products, Silicon Carbide Ceramic Products, Silicon Nitride Ceramic Products, Zirconium Dioxide Ceramic Products, Quartz Products, etc. Please feel free to contact us.

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By air, by sea, by express, as customers request.

5 FAQs of High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry

What material is the heating plate?
This plate uses aluminum nitride ceramic. AlN ceramic moves heat fast. It also blocks electricity well. This matters for semiconductors. The plate stays stable at high heat. It doesn’t change shape much. AlN works well for tough chip making steps.

How hot does it get?
This plate reaches very high temperatures. It works reliably up to 1000°C. Some versions go higher. You control the heat precisely. This is vital for baking wafers. Consistent heat is needed for good chip results.

Why is thermal conductivity important?
Good heat movement is crucial. AlN ceramic moves heat fast. This means the plate heats evenly. Hot spots ruin wafers. Even heating gives uniform results. Fast heat transfer speeds up the process. It saves time and energy.

Is the plate durable?
Yes, AlN ceramic is very strong. It handles repeated heating cycles well. It resists wear and cracking. The plate doesn’t break down easily. This reduces replacement costs. It keeps production running smoothly.

Does it work with different processes?
Yes, this plate suits many semiconductor steps. It works for annealing, baking, and curing. AlN ceramic is chemically stable. It doesn’t react with most process gases. This makes it very versatile. Different chip makers use it.

(High Temperature Aln Aluminum Nitride Ceramic Tray Heating Plate for Semiconductor Industry)