Overview of aluminum nitride ceramics

Aluminum Nitride Ceramic is an advanced ceramic material with aluminum nitride as the main component. It has been widely used in electronics, optics, and mechanics due to its unique properties.

Features of aluminum nitride ceramics

High thermal conductivity: Aluminum nitride ceramics have relatively high thermal conductivity, usually between 170-260 W/m·K, which makes it an excellent heat dissipation material. It is especially suitable for electronic devices that require efficient heat dissipation, such as substrate materials for power semiconductor devices.

Good electrical insulation: Despite its high thermal conductivity, aluminum nitride ceramics are excellent insulators of electricity, which can effectively prevent current leakage and ensure the safe operation of electronic components.

Low dielectric constant and dielectric loss: These characteristics make aluminum nitride ceramics very suitable for use in high-frequency circuits because it can reduce energy loss during signal transmission.

High temperature resistance: Aluminum nitride ceramics can maintain structural stability and strength at extremely high temperatures. Its melting point is about 2800°C, so it is suitable for applications in high temperature environments.

Low thermal expansion coefficient: Compared with semiconductor materials such as silicon, aluminum nitride has a lower thermal expansion coefficient, which means it has better dimensional stability when the temperature changes, which helps improve packaging reliability.

Corrosion resistance: Aluminum nitride ceramics have good chemical stability to most molten metals and are not easily oxidized or corroded, allowing them to perform well in harsh environments.

High mechanical strength: Although not as hard as some other types of ceramic materials, aluminum nitride ceramics still provide enough mechanical strength to allow them to be used in many structural applications.

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Specifications of Hot ing Alumina Nitride Sheet Substrate Wafer Aluminum Nitride Ceramic Substrate Aln Wafer

The Hot Isostatic Pushed Light Weight Aluminum Nitride (AlN) Ceramic Substrate Wafer provides high-performance solutions for advanced digital applications. Made from pure aluminum nitride powder, the material undergoes hot isostatic pushing. This process makes certain high thickness, uniform structure, and boosted thermal buildings. The substrate includes a thermal conductivity of 170-200 W/m · K, permitting efficient warm dissipation in high-power tools. Its thermal growth coefficient carefully matches silicon, minimizing stress at product interfaces throughout temperature level adjustments. Electrical insulation continues to be steady, with a quantity resistivity going beyond 10 ^ 14 Ω · centimeters. The product stands up to chemical deterioration, maintaining efficiency in harsh settings. Mechanical stamina is high, with a flexural strength of 300-400 MPa and a firmness of 12 GPa. Standard density options array from 0.3 mm to 3.0 mm. Custom densities are available. Diameters vary from 10 mm to 150 mm for rounded wafers. Rectangular or square substrates can be created in sizes as much as 200 mm. Surface area finishes include polished or lapped alternatives. Refined surface areas achieve a roughness below 0.1 μm Ra. Flatness is controlled within 10 μm per 25 mm. Limited tolerances make sure compatibility with thin-film deposition and circuit printing procedures. Applications consist of power electronic devices, LED packaging, RF modules, and semiconductor product packaging. The substratum fits high-frequency circuits, laser diode places, and vehicle electronic devices. Customized metallization layers like gold, silver, or copper can be used. Laser reducing and piercing services allow specific form personalization. The wafer operates dependably in temperatures from -50 ° C to 1000 ° C. Vacuum compatibility makes it excellent for aerospace applications. Appropriate handling is needed to prevent side chipping. Storage in completely dry problems avoids wetness absorption. Each set goes through top quality checks for dimensional accuracy and home confirmation.

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Applications of Hot ing Alumina Nitride Sheet Substrate Wafer Aluminum Nitride Ceramic Substrate Aln Wafer

Hot-pressed alumina nitride (AlN) sheet substratum wafers are advanced ceramic materials with distinct homes. These wafers master high thermal conductivity, electrical insulation, and resistance to severe temperatures. They are widely made use of across markets calling for reliable warm management and trustworthy performance.

AlN wafers play a vital function in electronic devices. They serve as substrates for semiconductor devices like power amplifiers and high-frequency circuits. Their capability to dissipate warm rapidly protects against getting too hot in portable electronic systems. This guarantees secure operation in gadgets such as smartphones, computer systems, and communication tools.

The LED industry heavily depends on AlN ceramic substrates. LEDs produce considerable warmth during operation. AlN wafers move this heat far from light-emitting elements, prolonging LED lifespan and maintaining brightness. This makes them ideal for high-power lighting systems, automotive fronts lights, and industrial displays.

Power modules in renewable energy systems gain from AlN substratums. Solar inverters and wind generator converters require materials that handle high voltages and temperature levels. AlN’s electrical insulation and thermal security enhance energy conversion effectiveness. This reduces energy loss and sustains lasting power generation.

Automotive and aerospace applications utilize AlN wafers for their longevity. Electric automobiles make use of these substrates in battery monitoring and electric motor control systems. They stand up to extreme conditions like resonance and rapid temperature level modifications. In aerospace, AlN elements make sure reliability in navigation and interaction systems revealed to extreme atmospheres.

Telecom infrastructure depends on AlN for signal processing. High-frequency devices like radar and satellite systems use AlN substratums to decrease signal loss. The material’s low thermal expansion matches silicon, avoiding mechanical tension in incorporated circuits.

Clinical gadgets take advantage of AlN’s biocompatibility and accuracy. They are utilized in imaging devices and medical devices where accuracy and heat control are crucial. AlN substratums make certain risk-free, efficient efficiency in delicate medical settings.

AlN wafers additionally sustain advanced production processes. Their chemical resistance makes them ideal for plasma etching chambers and semiconductor fabrication tools. This minimizes wear and upkeep costs in industrial settings.

Company Introduction

Advanced Ceramics founded on October 17, 2014, is a high-tech enterprise committed to the research and development, production, processing, sales and technical services of ceramic relative materials and products.. Since its establishment in 2014, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Silicon carbide ceramic products, Boron Carbide Ceramic Products, Boron Nitride Ceramic Products, Silicon Carbide Ceramic Products, Silicon Nitride Ceramic Products, Zirconium Dioxide Ceramic Products, Quartz Products, etc. Please feel free to contact us.(nanotrun@yahoo.com)

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5 FAQs of Hot ing Alumina Nitride Sheet Substrate Wafer Aluminum Nitride Ceramic Substrate Aln Wafer

What is aluminum nitride ceramic substrate?
Aluminum nitride (AlN) ceramic substrate is a high-performance material. It is made by hot-pressing alumina nitride powder. It has excellent thermal conductivity and electrical insulation. It is used in electronics for heat management. It works in circuits, LED lighting, and power modules.

Why is high thermal conductivity important?
High thermal conductivity helps move heat away from sensitive parts. This stops devices from overheating. Aluminum nitride conducts heat better than many ceramics. It is ideal for high-power applications. Devices last longer and perform better.

Can aluminum nitride handle high temperatures?
Yes. Aluminum nitride works in extreme heat. It resists temperatures up to 1,800°C in inert gas. It expands little when heated. This keeps parts stable during temperature changes. It suits industries like aerospace and automotive.

How smooth is the surface of AlN wafers?
The surface is very smooth and flat. Precision grinding and polishing create this finish. A smooth surface ensures thin films or metal layers stick well. This reduces defects in microelectronics or semiconductor devices.

How is AlN different from alumina or beryllia ceramics?
Aluminum nitride conducts heat better than alumina. It is safer than beryllia, which is toxic. AlN offers strong insulation and heat control. It is chosen for advanced electronics needing reliability and safety.

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