Introduction to 3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets

Alumina ceramics are known for their high hardness, wear resistance, corrosion resistance, good electrical insulation and high temperature stability. According to the different alumina content, it can be divided into different grades, such as 95 porcelain, 99 porcelain, etc., among which 99 porcelain refers to ceramic materials with an alumina content of 99%. As the alumina content increases, its mechanical strength and electrical insulation properties will also increase accordingly.

Characteristics of 3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets

High Hardness: Alumina ceramics have extremely high hardness, which makes it very wear-resistant and suitable for manufacturing abrasive tools and parts that require wear resistance.

Wear resistance: Due to its high hardness, alumina ceramics show excellent wear resistance and are suitable for manufacturing parts for long-term use.

Corrosion resistance: Alumina ceramics have good resistance to most acids and alkalis, making them widely used in the chemical industry.

Good electrical insulation: As an excellent electrical insulating material, alumina ceramics are widely used in electronic and electrical products.

High temperature stability: Ability to withstand extremely high temperatures without significant physical or chemical changes, which makes it an ideal choice for applications in high temperature environments.

Biocompatibility: In the medical field, certain grades of alumina ceramics are used to make medical devices such as artificial joints due to their good biocompatibility.

(3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets)

Specifications of 3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets

Our customized Al2O3 ceramic targets offer high purity options for your thin film deposition needs. Choose from 3N (99.9% pure), 4N (99.99% pure), or 5N (99.999% pure) Aluminum Oxide. These purity levels directly impact film quality. Higher purity means fewer impurities. This results in better film performance. We make targets in many shapes. Common options include discs, rectangles, and tubes. We also make custom shapes. Tell us your design requirements. We can accommodate various sizes. Dimensions depend on your sputtering system. Our standard thickness range is suitable for most applications. We can adjust thickness for specific needs. Density is crucial for target performance. Our Al2O3 targets achieve high density. This minimizes issues during sputtering. We control grain size carefully. Consistent grain size ensures stable deposition rates. This leads to uniform film thickness. Surface finish matters too. We provide excellent surface quality. Smooth surfaces reduce arcing and particle generation. We offer different bonding options. Bonded targets are common. They use backing plates for efficient heat transfer. We bond targets securely. This prevents detachment during use. Unbonded targets are available. We machine all targets precisely. Tight tolerances ensure a proper fit in your chamber. We understand specific project requirements. Tell us your purity, shape, size, density, grain size, and surface finish needs. We produce targets tailored exactly to your specifications. This flexibility supports diverse research and production goals. High purity Al2O3 targets are essential for many applications. They create high-quality insulating layers. These layers are used in semiconductors and optical coatings. They are also used in protective coatings. Customized targets help achieve the exact film properties you need. We focus on quality control throughout manufacturing. This guarantees reliable performance. Our goal is to meet your technical demands perfectly.

(3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets)

Applications of 3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets

Al2O3 ceramic targets are essential for thin film deposition. Sputtering uses these targets. The purity level is critical. We offer customized Al2O3 targets. Our targets come in 3n, 4n, and 5n purity grades. These meet different application needs. Each purity level serves specific industries.

3n purity targets (99.9% pure) are common. They are cost-effective for many uses. These targets deposit protective coatings. These coatings shield surfaces from wear. They also resist corrosion. 3n targets work well for optical films. These films improve light transmission. They reduce reflection too. 3n is suitable for general industrial applications. It provides good performance without high cost.

4n purity targets (99.99% pure) are better. They are for more demanding tasks. Electronics often require this purity. Semiconductors need high-quality insulating layers. 4n Al2O3 films offer excellent electrical insulation. They provide good thermal stability. These films are vital for microelectronics. They help build capacitors and transistors. Thin film sensors also benefit. Higher purity means fewer defects.

5n purity targets (99.999% pure) are the best. They are for top-tier applications. Advanced research uses these targets. Cutting-edge semiconductor devices need extreme purity. 5n minimizes impurities in films. This is crucial for quantum computing components. It matters for specialized photonic devices too. Achieving this purity is hard. It demands careful processing.

Customization options are important. We tailor targets to your process. Size and shape must match your sputtering system. Thickness affects deposition rates and film quality. We control these parameters precisely. Composition is consistent throughout the target. This ensures uniform film properties. Dense targets prevent issues like cracking. High density is necessary for stable sputtering.

Choose the right purity for your project. Consider your specific film requirements. Think about your budget constraints. We supply reliable Al2O3 targets. Our products support diverse manufacturing goals.

Company Introduction

Advanced Ceramics founded on October 17, 2014, is a high-tech enterprise committed to the research and development, production, processing, sales and technical services of ceramic relative materials and products.. Since its establishment in 2014, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Silicon carbide ceramic products, Boron Carbide Ceramic Products, Boron Nitride Ceramic Products, Silicon Carbide Ceramic Products, Silicon Nitride Ceramic Products, Zirconium Dioxide Ceramic Products, Quartz Products, etc. Please feel free to contact us.

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of 3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets

What are 3N, 4N, and 5N Al2O3 targets?
3N, 4N, and 5N tell you how pure the aluminum oxide is. 3N means the material is 99.9% pure. 4N means 99.99% pure. 5N means 99.999% pure. Higher purity gives better film quality. We make all these purity levels.

Can I get custom sizes and shapes?
Yes. We specialize in custom sizes. Need a specific diameter? We can do that. Need a rectangle instead of a circle? We can do that too. Tell us your exact dimensions. We will make it fit your sputtering system perfectly.

What are Al2O3 targets used for?
These targets deposit thin aluminum oxide films. These films are important. They are used as protective coatings. They are used as insulating layers. You find them in things like displays. You find them in solar cells. You find them in semiconductors. You find them in sensors.

What about surface quality?
We pay close attention to the surface. A smooth, defect-free surface is vital. It ensures consistent film deposition. It prevents issues like arcing. We carefully control the surface roughness. We carefully control the flatness. We carefully control any defects.

Why choose customized targets?
Standard sizes might not fit your machine. Custom sizes solve this problem. You avoid wasting material. You get the exact shape you need. Higher purity options improve your film properties. We make targets that match your specific coating challenge.

(3n, 4n, 5n Customized Al2O3 Ceramic Target Aluminum Oxide Sputtering Targets)